Tetramethylammonium Hydroxide (75-59-2)

Name: Tetramethylammonium Hydroxide (75-59-2)
Brand: TRIVENI INTERCHEM PVT. LTD.
Price: 450.0 INR
Availability: InStock

Price 450.0 INR/ Kilograms

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MOQ : 25 Kilograms

Tetramethylammonium Hydroxide (75-59-2) Specification

Solubility
Soluble in water

Melting Point
60 C

Appearance
White crystalline solid

Properties
Tetramethylammonium hydroxide is a strong quaternary ammonium base widely used in semiconductor manufacturing as a high-purity photoresist developer and etchant.

Application
Industrial

Purity
98 99%

Refractive Rate
1.45

Physical Form
Solid

CAS No
75-59-2

Structural Formula
C4H12N.HO

Usage
Strong base used as an etchant in semiconductor manufacturing and as a reagent in chemical synthesis

Molecular Weight
91.15 g/mol Grams (g)

Molecular Formula
C4H12N.HO

About Tetramethylammonium Hydroxide (75-59-2)

We are Supplier, Exporter and Contract Manufacturer.

Technical profile of Tetramethylammonium Hydroxide, a high-purity raw chemical material supplied by Triveni Chemicals for industrial manufacturing and laboratory synthesis.

Technical Specifications:

CAS Number: 75-59-2

Chemical Formula: C4H12N.HO

Industrial Uses & Applications:

It Is Typically Supplied As A Clear, Colorless Aqueous Solution And Is Highly Soluble In Water. Tmah Is A Strong Organic Base Widely Used In Semiconductor Manufacturing For Photoresist Development And Silicon Etching. It Is Also Employed As A Catalyst, Phase-Transfer Reagent, And Analytical Reagent In Organic Synthesis.

High Purity for Demanding Industrial Applications

TMAH's purity of 98-99% ensures reliable performance in sensitive manufacturing environments. Its solid form and water solubility make it easy to handle and incorporate into diverse processes. Semiconductors, chemicals, and related industries rely on TMAH for precision and consistent results.

Exceptional Performance in Semiconductor Manufacturing

As a strong quaternary ammonium base, TMAH is crucial for photoresist development and etching in semiconductor fabrication. Its high reactivity and solubility facilitate efficient and uniform processing, supporting high yields and quality standards. This makes it a preferred choice for demanding technological applications.

FAQ's of Tetramethylammonium Hydroxide (75-59-2):

Q: How is Tetramethylammonium Hydroxide typically used in the semiconductor industry?

A: Tetramethylammonium Hydroxide is primarily used as a high-purity photoresist developer and etchant in semiconductor manufacturing. Its strong basic properties enable precise pattern development and efficient etching during the chip fabrication process.

Q: What benefits does TMAH offer for industrial applications?

A: TMAH offers high purity, strong base properties, and excellent solubility in water, making it ideal for sensitive industrial processes. It delivers reliable results in semiconductor etching and chemical synthesis, supporting high product quality and process efficiency.

Q: When should TMAH be used over other etchants or bases?

A: TMAH should be chosen when high purity and strong quaternary ammonium base characteristics are essential, such as in advanced semiconductor fabrication or precise chemical synthesis applications, where contaminants or weaker bases could compromise results.

Q: Where is TMAH produced and supplied from?

A: TMAH is manufactured and supplied by various chemical companies in India, catering to both domestic and international industrial markets. It is available from specialized suppliers focused on high-purity industrial chemicals.

Q: What is the typical process for using TMAH as a developer or etchant?

A: In semiconductor processes, TMAH is dissolved in water to form a working solution. The substrate is then immersed or coated with this solution, allowing TMAH to selectively develop photoresist or etch specific layers with precision and reproducibility.

Q: Is Tetramethylammonium Hydroxide safe to use, and what precautions should be taken?

A: While effective, TMAH is a strong base and should be handled with appropriate safety measures, such as wearing gloves, goggles, and protective clothing, and ensuring good ventilation. Proper training is recommended to avoid chemical burns and inhalation risks.

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